Hydroxyapatite–bioglass nanocomposites: Structural, mechanical, and biological aspects

• Olga Shikimaka,
• Mihaela Bivol,
• Bogdan A. Sava,
• Marius Dumitru,
• Christu Tardei,
• Beatrice G. Sbarcea,
• Daria Grabco,
• Constantin Pyrtsac,
• Daria Topal,
• Andrian Prisacaru,
• Vitalie Cobzac and
• Viorel Nacu

Beilstein J. Nanotechnol. 2022, 13, 1490–1504, doi:10.3762/bjnano.13.123

• special cleaning process for 6 min in a nitrogen plasma jet in a FISCHONE Plasma Cleaner. A FEI QUANTA INSPECT S SEM was used to observe structure and morphology of the samples after their treatment in simulated body fluid, as well as to acquire the energy-dispersive X-ray (EDX) spectra and the elemental

Effects of focused electron beam irradiation parameters on direct nanostructure formation on Ag surfaces

• Jānis Sniķeris,
• Vjačeslavs Gerbreders,
• Andrejs Bulanovs and
• Ēriks Sļedevskis

Beilstein J. Nanotechnol. 2022, 13, 1004–1010, doi:10.3762/bjnano.13.87

• shape of the resulting structures on an Ag surface. In addition, we investigate how the nitrogen plasma cleaning procedure of a vacuum chamber can affect the growth of these structures. A beam current of around 40 pA resulted in the fastest structure growth rate. By increasing the beam diameter and

• formation of nanostructures. This was done by irradiating the Ag surface with a focused EB before and after the nitrogen plasma cleaning procedure in the SEM vacuum chamber. The procedure lasted 5 min and the applied power was 20 W. The time was counted from the end of the cleaning procedure. The sample had

• surface as functions of time following chamber decontamination by nitrogen plasma cleaning. Constant EB parameters are: U = 30 kV, I = 55 pA, d = 14 nm, t = 30 s, and α = 0°. A representative AFM image of a nanostructure on an Ag surface after sustaining damage from N plasma cleaning. Constant EB

Tuning the performance of vanadium redox flow batteries by modifying the structural defects of the carbon felt electrode

• Ditty Dixon,
• Deepu Joseph Babu,
• Aiswarya Bhaskar,
• Hans-Michael Bruns,
• Joerg J. Schneider,
• Frieder Scheiba and
• Helmut Ehrenberg

Beilstein J. Nanotechnol. 2019, 10, 1698–1706, doi:10.3762/bjnano.10.165

• are as beneficial as the presence of oxygen functional groups for the improved performance of VRFBs. Therefore, for an optimum performance of VRFBs, defects such as N-substitution as well as oxygen functionality should be tuned. Keywords: carbon felt; defects; nitrogen plasma; vanadium redox flow

Growth of lithium hydride thin films from solutions: Towards solution atomic layer deposition of lithiated films

• Ivan Kundrata,
• Karol Fröhlich,
• Lubomír Vančo,
• Matej Mičušík and
• Julien Bachmann

Beilstein J. Nanotechnol. 2019, 10, 1443–1451, doi:10.3762/bjnano.10.142

• the most popular solid-state electrolyte. Two approaches have been demonstrated in 2015. One is a quaternary process [8] adopting the lithium tert-butoxide and water process used to deposit Li2O. To the cycle additional pulses of trimethylphosphate and nitrogen plasma were added, incorporating

Controlling surface morphology and sensitivity of granular and porous silver films for surface-enhanced Raman scattering, SERS

• Sherif Okeil and
• Jörg J. Schneider

Beilstein J. Nanotechnol. 2018, 9, 2813–2831, doi:10.3762/bjnano.9.263

• plasma. Other samples treated with hydrogen plasma using different plasma gas flow conditions and plasma power show the ability of this process for tuning the surface morphology and roughness further (Figure S3, Supporting Information File 1). Formation of nitrogen plasma treated silver films Treatment

• (from 10 to 30 min). Furthermore, a faceting of the silver film underlying the formed nanoparticles is visible, which becomes more prominent with increasing nitrogen plasma treatment time from 10 to 60 min (Figure 3a–c). For the ultrathin 10 nm film as well as for the 50 nm film, this granular and

• facetted surface can be also observed depending on the nitrogen plasma treatment time (Figure S5, Supporting Information File 1). AFM analysis (Figure S6, Supporting Information File 1) revealed a significant increase in the surface roughness of the 200 nm silver films treated with nitrogen plasma

Metal-free catalysis based on nitrogen-doped carbon nanomaterials: a photoelectron spectroscopy point of view

• Mattia Scardamaglia and
• Carla Bittencourt

Beilstein J. Nanotechnol. 2018, 9, 2015–2031, doi:10.3762/bjnano.9.191

• nitrogen plasma and studied its interaction with molecular oxygen. They showed that the interaction results in oxygen dissociation and the formation of carbon–oxygen single bonds on graphene, as observed by X-ray absorption spectroscopy of the carbon K edge and the O 1s core level. After the exposure to

The effect of atmospheric doping on pressure-dependent Raman scattering in supported graphene

• Egor A. Kolesov,
• Mikhail S. Tivanov,
• Olga V. Korolik,
• Olesya O. Kapitanova,
• Xiao Fu,
• Hak Dong Cho,
• Tae Won Kang and
• Gennady N Panin

Beilstein J. Nanotechnol. 2018, 9, 704–710, doi:10.3762/bjnano.9.65

• /isopropyl alcohol mixture was used to wash graphene from etching products [31]. PMMA was removed by submerging the sample in glacial acetic acid (extra pure) [32] for 4 h. Graphene, doped with nitrogen, was prepared using a nitrogen-plasma treatment described elsewhere [33]. The Raman spectra were obtained

Sublattice asymmetry of impurity doping in graphene: A review

• James A. Lawlor and
• Mauro S. Ferreira

Beilstein J. Nanotechnol. 2014, 5, 1210–1217, doi:10.3762/bjnano.5.133

• methods and techniques to achieve this have been developed to include chemical vapour deposition (CVD), using NH3 as a precursor, arc discharge [23], embedded nitrogen and carbon sources within a metal substrate [24], ion implantation [25][26], ammonia [27] or nitrogen plasma [28][29] treatments, and

Functionalization of vertically aligned carbon nanotubes

• Eloise Van Hooijdonk,
• Carla Bittencourt,
• Rony Snyders and
• Jean-François Colomer

Beilstein J. Nanotechnol. 2013, 4, 129–152, doi:10.3762/bjnano.4.14

• electrochemical properties of the VA-CNTs. Nitration of VA-CNTs: Fluorination of VA-CNTs increases their field-emission performance. Another solution lies in the utilization of post-growth nitrogen plasma treatment. This method was proposed by Lai et al. [109] in 2009. Patterned VA-CNTs, with an ideal hexagon

• arrangement, were used. Nitrogen doping was incorporated in the CNT bundles by nitrogen RF-plasma treatment (20 W of power, at a pressure of 27 Pa) with various exposure times (10–100 min), indicating the correlation between the duration of the nitrogen plasma treatment, i.e., an optimal doping concentration

• of impurities and the threshold electric field. (Figure 12) Lai et al. recorded the lowest threshold electric field (with a value of 2.3 V/µm) for the highest nitrogen content of CNTs (4.08 atom %), i.e., for a 70 min nitrogen plasma treatment. The field emission characteristics of CNTs depend on